Jean-Paul Booth is a CNRS research director at the Laboratoire de Physique de Plasmas at Ecole Polytechnique near Paris. In 2006-08 he took time away from CNRS to work at Lam Research Corporation in California, where he was a technical director responsible for sensors and endpoint detection applied to plasma etch reactors.
Before 2000 he was a CNRS researcher at Université de Grenoble. JP Booth specialises in the experimental study of physics and chemistry occurring in plasmas in reactive gases at low pressures, and their interaction with surfaces. He long focussed on radiofrequency plasmas for materials processing in the microelectronics industry, but is now working on more fundamental questions and rigorous model validation.
He has developed and applied many novel optical diagnostic techniques (one- and two-photon laser-induced fluorescence, broad-band absorption spectroscopy, cavity ring-down spectroscopy, synchrotron vacuum-ultraviolet absorption) to measure reactive species densities and kinetics, as well as electrical probes, microwave resonance techniques for plasma physics parameters, and simpler sensors for in-situ control of industrial plasma processes.
He also has an interest in the physics of capacitively-coupled radiofrequency plasmas: breakdown, electromagnetic effects in VHF plasmas, tailored voltage waveform excitation for control of ion and electron fluxes and energy distributions.
- Optical and Electrical Diagnostics of Fluorocarbon Plasma Etching Processes, J.P. Booth, Plasma Sources, Science and Technology, 8, 249, (1999).
- Negative ions in single- and dual-frequency capacitively coupled fluorocarbon plasmas, G A Curley, D Maric, J-P Booth, C S Corr, P Chabert and J Guillon, Plasma Sources Sci. Technol 16 S87-S93 (2007).
- Strong Ionization Asymmetry in a Geometrically Symmetric Radio Frequency
Capacitively Coupled Plasma Induced by Sawtooth Voltage Waveforms
B Bruneau, T Gans, D O’Connell, A Greb, E V. Johnson and JP Booth, Phys. Rev. Lett. 114, 125002 (2015).
- Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma, J P Booth, O Guaitella, A Chatterjee, C Drag, V Guerra, D Lopaev, S Zyryanov, T Rakhimova, D Voloshin and Yu Mankelevich, Plasma Sources Sci. Technol. 28, 055005, (2019).