27th International School on Low Temperature Plasma Physics: Basics and Applications

List of teacher of the 28th International School on Low Temperature Plasma Physics and its Master Class 2025

  • Marc Böke (Ruhr-University Bochum, Germany)
  • Marina Prenzel (Ruhr-University Bochum, Germany)
  • Rony Snyders (University of Mons, Belgium)
  • Achim von Keudell (Ruhr-University Bochum, Germany)

Marc Böke (Ruhr-University Bochum, Germany)

Marc Böke was born in Bochum, Germany, on November 15, 1972. He received his PhD degree in Physics at Ruhr-University Bochum (RUB) with a PhD thesis dealing with Lithium atoms as probes for reactive plasmas. After his PhD he worked as executive secretary of Arbeitsgemeinschaft Plasmaphysik (APP) & Center of Excellence Plasma Science and Technology (CPST) at Ruhr-University Bochum. He is PI in several collaborative research projects at the Research Department Plasmas with Complex Interactions at RUB and works on diagnostic methods of low temperature plasmas, physics of microplasmas and plasma technology (e.g. plasma coatings on polymers). As a co-founder of a spin-off company in the field of plasma technology he was involved in the design of plasma sources for coating, functionalization or sterilization applications. Since 2001 he is responsible for the organization and the scientific concept of the school.


Key publications:
  1. Modeling and simulation of the plasma absorption probe. M Lapke, T Mussenbrock, and R P Brinkmann, C Scharwitz, M Böke, J Winter, Appl. Phys. Lett. 90, (2007) 121502, doi:/10.1063/1.2714202
  2. High Power Impulse Magnetron Sputtering Discharges: Instabilities and Plasma Self-Organization. AP Ehiasarian, A Hecimovic, T de los Arcos, R New, V Schulz-von der Gathen, M Böke, and J Winter, Appl. Phys. Lett. 100, (2012) 114101, doi: 10.1063/1.3692172
  3. Space resolved density measurements of argon and helium metastable atoms in radio-frequency generated He-Ar micro-plasmas. B Niermann, M Böke, N Sadeghi, and J Winter, Eur. Phys. J. D 60, (2010) 489-495, doi:10.1140/epjd/e2010-00166-8

Marina Prenzel (Ruhr-University Bochum, Germany)

Marina Prenzel is Science Manager of the Research Department 'Plasmas with Complex Interactions' at Ruhr-Universität Bochum (RD Plasma). She received her Ph.D. in physics in 2013 on a study of reactive magnetron sputtering. For three years she worked as a Potdoc at the Max-Planck-Institute for Chemical Energy Conversion in Mülheim (Germany) and moved at the beginning of 2017 back again to RUB, where she is responsible for the scientific organisation of the RD Plasma.


Key publications:
  1. Investigation of different pre-treated multi-walled carbon nanotubes by Raman spectroscopy. P Düngen, M Prenzel, C Van Stappen, N Pfänder, S Heumann, R Schlögl, Materials Sciences and Applications 8 (8), 628-641 (2017)
  2. Formation of crystalline gamma-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering. M Prenzel, A Kortmann, A von Keudell, F Nahif, J M Schneider, M Shihab, R P Brinkmann, J. Phys. D.: Appl. Phys. 46 (8), (2013) 084004
  3. Ion-induced secondary electron emission of oxidized nickel and copper studied in beam experiments. R Buschhaus et al 2022 Plasma Sources Sci. Technol. 31 025017

Rony Snyders (University of Mons, Belgium)

Rony Snyders received his PhD in Science from UMONS, Belgium in 2004. and carried out two post-doctoral stays at Ecole Polytechnique de Montreal, Canada (2004-2006) and RWTH Aachen University, Germany (2006-2007). He is now full professor at Faculty of Sciences of UMONS where he is head of the Plasma-Surface Interaction Chemistry (ChIPS) group since 2007. He is one of the Scientific Director of Materia Nova R&D, Mons, Belgium and since 2017, guest Professor at the Technical University of Tianjin, Tianjin, China. He is past-president of the Belgian Vacuum Society (2018-2021) and members of several boards: IONICS, IVT, INISMA, Materia Nova and EUNICE University. His interests are on the utilization of low pressure plasmas for the processing of materials and for the conversion of gases with a special attention to the characterization of the plasma phase during these processes. He has been promoting 24 PhD thesis and co-authored more than 250 peer-reviewed papers (H-index: 48; overall citations: 8150). At UMONS, he has been member of the Rectoral College as advisor for interregional matters (2019-2022) and is now member of the Rectoral board as coordinator of the European University EUNICE at UMONS.


Key publications:
  1. Foundations of plasma enhanced chemical vapor deposition of functional coatings R Snyders, D Hegemann, D Thiry, O Zabeida, J Klemberg-Sapieha, ... Plasma Sources Science and Technology 32 (7), 074001, 2023
  2. CO2 conversion using catalyst-free and catalyst-assisted plasma-processes: Recent progress and understanding G Chen, R Snyders, N Britun, Journal of CO2 Utilization 49, 101557, 2021
  3. Recent advances in the development of nano-sculpted films by magnetron sputtering for energy-related applications A Panepinto, R Snyders Nanomaterials 10 (10), 2039, 2020

Achim von Keudell (Ruhr-University Bochum, Germany)

Achim von Keudell is professor for experimental physics at Ruhr-University Bochum since 2003. Before, he was staff scientist at the Max Planck Institute for Plasma Physics in Munich. A. von Keudell specialised in plasma and surfaces physics. His experience encompasses in-situ ellipsometry, infrared spectroscopy and treatment of surfaces with plasma discharges. His group has been the first to quantify elementary surface processes in plasma surface interactions involving hydrocarbon radicals and hydrogen atoms. These serve as model experiments for the understanding of thin film growth in glow discharges. The projects until 2010 focussed on plasma technology particularly with regard to clusters in plasmas and plasma sterilisation. Since a few years, the research on reactive microplasmas developed with the emphasis on the fundamental understanding of the reaction chemistry as well as on on reactive magnetron sputtering and HPPMS discharges.


Key publications:
  1. Direct insertion of SiH3 radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films. A von Keudell, J R Abelson, Phys. Rev. B. 59, 5791 (1999)
  2. Elementary processes in plasma-surface interaction:H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces (review). A von Keudell, W Jacob, Progress in Surface Science 26, 21-54 (2004)