Stephanos Konstantinidis was born in Athens in 1978. He is currently Research Director at the National Fund for Scientific Research (FNRS, Belgium) and professor at the University of Mons in Belgium. During his doctoral thesis (UMONS 2004), Stephanos contributed to the fundamental understanding of ionized magnetron sputter deposition technology, in particular towards the development of High-Power Impulse Magnetron Sputtering (HiPIMS) processes.
At ChIPS lab, he studies plasma-surface interactions and thin film deposition by combining both advanced plasma analysis and surface characterization methods. He’s also developing sputtering-based processes for the synthesis of nanomaterials.
Tony Murphy was born in Sydney, Australia, too many years ago. He received a PhD in Physics from the University of Sydney and subsequently completed a postdoc at Max-Planck-Institut für Plasmaphysik in Munich. Since 1989, he has worked at CSIRO, Australia’s leading government research organisation, where he is now a Chief Research Scientist. (A prize will be awarded to all who can say what CSIRO stands for.) Tony’s main research area is thermal plasma processes, including arc welding, metallurgical applications, waste treatment, and plasma property calculation. In the past few years, he has also been active in plasma catalysis. He was a member of the team that developed the PLASCON waste destruction process and has led plasma modelling projects with several companies, including General Motors, Boeing, and China Rail and Rolling Stock Corporation. He has published over 300 refereed journal papers and has been awarded research medals and prizes by the International Plasma Chemistry Society, European Physical Society, Association of Asia-Pacific Physical Societies, Institute of Physics (UK), Australian Academy of Science, Australian Institute of Physics, NSW Government and Royal Society of NSW. He is Editor-in-Chief of Plasma Chemistry and Plasma Processing, an Associate Editor of Journal of Manufacturing Processes, and a member of the Editorial Boards of Journal of Physics D: Applied Physics, Reviews of Modern Plasma Physics, Welding in the World and Plasma Science and Technology; you are encouraged to submit your best work to these journals.
Key publications:- Foundations of high-pressure thermal plasmas. A B Murphy, D Uhrlandt, Plasma Sources Sci. Technol. 27 063001 (2018).
- A perspective on arc welding research: the importance of the arc, unresolved questions and future directions. A B Murphy, Plasma Chem. Plasma Process. 35 471–489 (2015).
- Thermodynamic properties and transport coefficients of arc lamp plasmas: argon, krypton and xenon. A B Murphy, E. Tam, J. Phys. D: Appl. Phys. 47 295202 (2014).
Marina Prenzel (Ruhr-University Bochum, Germany)
Marina Prenzel is Science Manager of the Research Department 'Plasmas with Complex Interactions' at Ruhr-Universität Bochum (RD Plasma). She received her Ph.D. in physics in 2013 on a study of reactive magnetron sputtering. For three years she worked as a Potdoc at the Max-Planck-Institute for Chemical Energy Conversion in Mülheim (Germany) and moved at the beginning of 2017 back again to RUB, where she is responsible for the scientific organisation of the RD Plasma.
Key publications:- Investigation of different pre-treated multi-walled carbon nanotubes by Raman spectroscopy. P Düngen, M Prenzel, C Van Stappen, N Pfänder, S Heumann, R Schlögl, Materials Sciences and Applications 8 (8), 628-641 (2017)
- Formation of crystalline gamma-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering. M Prenzel, A Kortmann, A von Keudell, F Nahif, J M Schneider, M Shihab, R P Brinkmann, J. Phys. D.: Appl. Phys. 46 (8), (2013) 084004
- Ion-induced secondary electron emission of oxidized nickel and copper studied in beam experiments. R Buschhaus et al 2022 Plasma Sources Sci. Technol. 31 025017
Antonio Tejero-del-Caz (University of Cordoba, Spain)
Antonio Tejero-del-Caz was born in Córdoba, Spain, on October 15th 1987. He received his PhD degree in Physics in June 2016, from the University of Córdoba (Spain). Antonio Tejero-del-Caz specialised in high-performance computing, GPGPU, and the development of CUDA enabled PIC algorithms for the study of sheaths in low pressure plasma and plasma-solid interaction. From September 2016 he is a postdoctoral researcher at Instituto de Plasmas e Fusão Nuclear within Instituto Superior Técnico (Portugal) where he is working in the N-Plasmas Reactive: Modelling and Engineering (N-PRiME) group. His current research is focused in the modelling and simulation of low-temperature plasmas of interest for biological and environmental applications. He is the main developer of the LisbOn KInetics (LoKI) tool suit, a set of computational tools to obtain numerical solutions of the electron Boltzmann equation (LoKI-B) and its self-consistent coupling with a global model to study the plasma chemistry (LoKI-C).
Key publications:- Experimental radial motion to orbital motion transition in cylindrical Langmuir probes in low pressure plasmas. J M Díaz-Cabrera, J Ballesteros, J I F Palop, A Tejero-del-Caz, Plasma Sources Sci. Technol. 24 (2015) 25026. doi:10.1088/0963-0252/24/2/025026.
- Radial-to-orbital motion transition in cylindrical Langmuir probes studied with particle-in-cell simulations. A Tejero-del-Caz, J I Fernández Palop, JM Díaz-Cabrera, J Ballesteros, Plasma Sources Sci. Technol. 25 (2016) 01LT03. doi:10.1088/0963-0252/25/1/01LT03
- Ion injection in electrostatic particle-in-cell simulations of the ion sheath. A Tejero-del-Caz, J I Fernández Palop, J M Díaz-Cabrera, G F Regodón, R Carmona-Cabezas, J Ballesteros, J. Comput. Phys. 350 (2017) 747–758. doi:10.1016/j.jcp.2017.09.018
Achim von Keudell (Ruhr-University Bochum, Germany)
Achim von Keudell is professor for experimental physics at Ruhr-University Bochum since 2003. Before, he was staff scientist at the Max Planck Institute for Plasma Physics in Munich.
A. von Keudell specialised in plasma and surfaces physics. His experience encompasses in-situ ellipsometry, infrared spectroscopy and treatment of surfaces with plasma discharges. His group has been the first to quantify elementary surface processes in plasma surface interactions involving hydrocarbon radicals and hydrogen atoms. These serve as model experiments for the understanding of thin film growth in glow discharges.
The projects until 2010 focussed on plasma technology particularly with regard to clusters in plasmas and plasma sterilisation. Since a few years, the research on reactive microplasmas developed with the emphasis on the fundamental understanding of the reaction chemistry as well as on on reactive magnetron sputtering and HPPMS discharges.
Key publications:- Direct insertion of SiH3 radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films. A von Keudell, J R Abelson, Phys. Rev. B. 59, 5791 (1999)
- Elementary processes in plasma-surface interaction:H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces (review). A von Keudell, W Jacob, Progress in Surface Science 26, 21-54 (2004)