Achim von Keudell

©Damian Gorczany

Achim von Keudell is professor for experimental physics at Ruhr-University Bochum since 2003. Before, he was staff scientist at the Max Planck Institute for Plasma Physics in Munich.

A. von Keudell specialised in plasma and surfaces physics. His experience encompasses in-situ ellipsometry, infrared spectroscopy and treatment of surfaces with plasma discharges. His group has been the first to quantify elementary surface processes in plasma surface interactions involving hydrocarbon radicals and hydrogen atoms. These serve as model experiments for the understanding of thin film growth in glow discharges.

The projects until 2010 focussed on plasma technology particularly with regard to clusters in plasmas and plasma sterilisation. Since a few years, the research on reactive microplasmas developed with the emphasis on the fundamental understanding of the reaction chemistry as well as on on reactive magnetron sputtering and HPPMS discharges.


  1. Direct insertion of SiH3 radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films, A. von Keudell, J.R. Abelson, Phys. Rev. B. 59, 5791 (1999)
  2. Elementary processes in plasma-surface interaction:H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces (review), A. von Keudell, W. Jacob, Progress in Surface Science 26, 21-54 (2004)
  3. Atmospheric microplasma jet source as depositing tool, J. Benedikt, K. Focke, A. Yanguas-Gil, A- von Keudell, Appl. Phys. Lett. 89, 251504 (2006)
  4. Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium, C Maszl, W Breilmann, J Benedikt and A von Keudell, J. Phys. D: Appl. Phys. 47 224002 (2014)