Michael Klick is CEO of Plasmatrex GmbH and lecturer at the Ruhr-University-Bochum since 2008 (Plasma and RF technology for semiconductor, MEMS, and PV applications). He obtained his PhD in Plasma Physics from the Ernst-Moritz-Arndt-University Greifswald, Germany, in 1992. From 1995 he has worked in the semiconductor industry with regard to plasma process models, in particular nonlinear modeling of industrial RF plasmas (boundary sheath). He was in charge of the development of plasma sensor systems for etch and deposition plasmas. Being involved in many plasma process and equipment projects, he is very familiar with industrial plasma process equipment and its model-based description.
Tony Murphy was born in Sydney, Australia (unlike Vasco Guerra) many years ago. He received a PhD in Physics from the University of Sydney, and subsequently did a postdoc at Max-Planck-Institut für Plasmaphysik. Since 1989, he has worked at CSIRO, Australia’s main government research organisation, where he is now a Chief Research Scientist. (A prize will be awarded to all who can say what CSIRO stands for).
Tony’s main research area is thermal plasma processes, including arc welding, waste treatment, and plasma property calculation. He has also worked on several other topics, including water splitting using solar energy, ice crystal nucleation in jet engine exhausts, and metal 3D printing. He was a member of the team that developed the PLASCON waste destruction process, and has led plasma modelling projects with several companies, including General Motors, Boeing and Siemens. He has over 200 refereed journal publications, and has been awarded research medals by the Institute of Physics (UK), Australian Academy of Science, Australian Institute of Physics and the Royal Society of NSW. He is Editor-in-Chief of Plasma Chemistry and Plasma Processing, and a member of the Editorial Boards of Journal of Physics D: Applied Physics and Scientific Reports; you are encouraged to submit your best work to these journals. Key publications:
- Calculation and application of combined diffusion coefficients in thermal plasmas. A B Murphy, Sci. Rep. 4 4304 (5 pp.) (2014).
- Thermodynamic properties and transport coefficients of arc lamp plasmas: argon, krypton and xenon. A B Murphy, E. Tam, J. Phys. D: Appl. Phys. 47 295202 (10 pp.) (2014).
- A perspective on arc welding research: the importance of the arc, unresolved questions and future directions. A B Murphy, Plasma Chem. Plasma Process. 35 471–489 (2015).
Marina Prenzel (Ruhr-University Bochum, Germany)
Marina Prenzel is Science Manager of the Research Department 'Plasmas with Complex Interactions' at Ruhr-Universität Bochum (RD Plasma). She received her Ph.D. in physics in 2013 on a study of reactive magnetron sputtering. For three years she worked as a Potdoc at the Max-Planck-Institute for Chemical Energy Conversion in Mülheim (Germany) and moved at the beginning of 2017 back again to RUB, where she is responsible for the scientific organisation of the RD Plasma. Key publications:
- Investigation of different pre-treated multi-walled carbon nanotubes by Raman spectroscopy. P Düngen, M Prenzel, C Van Stappen, N Pfänder, S Heumann, R Schlögl, Materials Sciences and Applications 8 (8), 628-641 (2017)
- Formation of crystalline gamma-Al2O3 induced by variable substrate biasing during reactive magnetron sputtering. M Prenzel, A Kortmann, A von Keudell, F Nahif, J M Schneider, M Shihab, R P Brinkmann, J. Phys. D.: Appl. Phys. 46 (8), (2013) 084004
- Ion-induced secondary electron emission of oxidized nickel and copper studied in beam experiments. R Buschhaus et al 2022 Plasma Sources Sci. Technol. 31 025017
Antonio Tejero-del-Caz (University of Cordoba, Spain)
Antonio Tejero-del-Caz was born in Córdoba, Spain, on October 15th 1987. He received his PhD degree in Physics in June 2016, from the University of Córdoba (Spain). Antonio Tejero-del-Caz specialised in high-performance computing, GPGPU, and the development of CUDA enabled PIC algorithms for the study of sheaths in low pressure plasma and plasma-solid interaction. From September 2016 he is a postdoctoral researcher at Instituto de Plasmas e Fusão Nuclear within Instituto Superior Técnico (Portugal) where he is working in the N-Plasmas Reactive: Modelling and Engineering (N-PRiME) group. His current research is focused in the modelling and simulation of low-temperature plasmas of interest for biological and environmental applications. He is the main developer of the LisbOn KInetics (LoKI) tool suit, a set of computational tools to obtain numerical solutions of the electron Boltzmann equation (LoKI-B) and its self-consistent coupling with a global model to study the plasma chemistry (LoKI-C). Key publications:
- Experimental radial motion to orbital motion transition in cylindrical Langmuir probes in low pressure plasmas. J M Díaz-Cabrera, J Ballesteros, J I F Palop, A Tejero-del-Caz, Plasma Sources Sci. Technol. 24 (2015) 25026. doi:10.1088/0963-0252/24/2/025026.
- Radial-to-orbital motion transition in cylindrical Langmuir probes studied with particle-in-cell simulations. A Tejero-del-Caz, J I Fernández Palop, JM Díaz-Cabrera, J Ballesteros, Plasma Sources Sci. Technol. 25 (2016) 01LT03. doi:10.1088/0963-0252/25/1/01LT03
- Ion injection in electrostatic particle-in-cell simulations of the ion sheath. A Tejero-del-Caz, J I Fernández Palop, J M Díaz-Cabrera, G F Regodón, R Carmona-Cabezas, J Ballesteros, J. Comput. Phys. 350 (2017) 747–758. doi:10.1016/j.jcp.2017.09.018
Achim von Keudell (Ruhr-University Bochum, Germany)
Achim von Keudell is professor for experimental physics at Ruhr-University Bochum since 2003. Before, he was staff scientist at the Max Planck Institute for Plasma Physics in Munich.
A. von Keudell specialised in plasma and surfaces physics. His experience encompasses in-situ ellipsometry, infrared spectroscopy and treatment of surfaces with plasma discharges. His group has been the first to quantify elementary surface processes in plasma surface interactions involving hydrocarbon radicals and hydrogen atoms. These serve as model experiments for the understanding of thin film growth in glow discharges.
The projects until 2010 focussed on plasma technology particularly with regard to clusters in plasmas and plasma sterilisation. Since a few years, the research on reactive microplasmas developed with the emphasis on the fundamental understanding of the reaction chemistry as well as on on reactive magnetron sputtering and HPPMS discharges. Key publications:
- Direct insertion of SiH3 radicals into strained Si-Si surface bonds during plasma deposition of hydrogenated amorphous silicon films. A von Keudell, J R Abelson, Phys. Rev. B. 59, 5791 (1999)
- Elementary processes in plasma-surface interaction:H-atom and ion-induced chemisorption of methyl on hydrocarbon film surfaces (review). A von Keudell, W Jacob, Progress in Surface Science 26, 21-54 (2004)
- Atmospheric microplasma jet source as depositing tool. J Benedikt, K Focke, A Yanguas-Gil, A von Keudell, Appl. Phys. Lett. 89, 251504 (2006)
Powered by ChronoForms - ChronoEngine.com